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    Talks 1-20 21-40 41-60 61-80 81-100 101-126

     

     

    1. L. Ling, X. Hua, L. Zheng, G. S. Oehrlein,E. A. Hudson, P. Jiang, P. Lazzeri, M. Anderle and Y. Wang, “Fluorocarbon Surface Chemistry in Dual Frequency Capacitively Coupled Discharges for Dielectric Etching: A Comparison with Inductively Coupled Plasmas”, AVS 51st International Symposium, Anaheim, CA, November 14-19, 2004.

    2. M. Anderle, L. Pasquardini, L. Lunelli, R. Canteri, P. Villani, C. Pederzolli, “Development of an Antimicrobial Polymer Surface Coating for the Prevention of Staphylococcal Infections”, AVS 51st International Symposium, Anaheim, CA, November 14-19, 2004.

    3. L. Ling, X. Hua, T. Kwon, S. Engelmann, R. Phaneuf, G. S. Oehrlein, E. A. Hudson,P. Lazzeri and M. Anderle, “Investigation of Surface Modifications of 193 nm and 248 nm Photoresist Materials During Low-Pressure Plasma Etching “, AVS ICMI ’05, Santa Clara (CA), March 21-23, 2005.

    4. N. Ghalichechian, A. Modafe, P. Lazzeri, V. Micheli, M. Anderle and R. Ghodssi “Characterization of Benzocyclobutene and Chromium-Gold Film Interface for Application in Silicon Micromachining”, 2005 MRS Spring Meeting, S.Francisco, CA, March 28 – April 1, 2005.

    5. G. Speranza, L. Minati, M. Anderle, “Modeling materials for photonic applications“, 1st Workshop on “Photoluminescence in rare earths: photonic materials and devices”, PRE05, Trento, Italy, May 2-3, 2005.

    6. P. Lazzeri, X. Hua, G. Oehrlein, E. Iacob, M. Barozzi, M. Bersani and M. Anderle, “ToF-SIMS and AFM studies of low-k dielectric etching in fluorocarbon plasmas”, The 15th International Conference on Secondary Ion Mass Spectrometry (SIMS XV), Manchester (UK), September 12-16, 2005

    7. D. Giubertoni, E. Iacob, M. Barozzi, S. Pederzoli, L. Vanzetti, M. Anderle and M. Bersani, “Boron Ultra Low Energy SIMS Depth Profiling improved by Rotating Stage”, The 15th International Conference on Secondary Ion Mass Spectrometry (SIMS XV), Manchester (UK), September 12-16, 2005

    8. M. Bersani, D. Giubertoni, M. Barozzi, S. Pederzoli, M. Anderle, J. A. van den Berg, M. Werner, “Comparison between SIMS and MEIS Technique on Arsenic Ultra Shallow Characterization”, The 15th International Conference on Secondary Ion Mass Spectrometry (SIMS XV),
      Manchester (UK), September 12-16, 2005

    9. S. Engelmann, T. Kwon, X. Hua, R. Phaneuf, G. S. Oehrlein, Y. C. Bae, D. Graves, E. Pargon, E. A. Hudson, P. Lazzeri and M. Anderle, “Interactions of Plasmas with Model Polymers for Advanced Photoresists”; AVS 52nd International Symposium, Boston, MA, October 30 – November 4, 2005.

    10. G. Gottardi, N. Laidani, L. Calliari, M. Filippi, R.S. Brusa, C. Macchi, S. Mariazzi, M. Anderle, “Amorphous carbon thin films deposition by pulsed substrate biased PACVD using a CH4-CO2 gas misture”, AVS 52nd International Symposium, Boston, MA, October 30 – November 4, 2005.

    11. S. Forti, M. Vinante, L. Pasquardini, L. Lunelli, L. Vanzetti, R. Canteri, C. Pederzolli, M. Anderle, S. Pascale, and G. Rossetti, “Role of the chemical and morphological surface properties in platelet bindings and protein adsorpion to biomaterial surfaces”, AVS 52nd International Symposium, Boston, MA, October 30 – November 4, 2005.

    12. M. Vinante, C. Pederzolli, L. Pasquardini, L. Lunelli, R. Canteri, M. Anderle, C. Potrich, G. Viero, M. Dalla Serra, G. Prevost, and O. Joubert, “Controlled releaseof calixarenes from chitosan hydrogel coated polymeric surfaces as antimicrobial treatment of staphilococcal infections”, AVS 52nd International Symposium, Boston, MA, October 30 – November 4, 2005.

    13. X. Hua, G.S. Oehrlein, P. Lazzeri, M. Anderle, “Nanoscale Plasma Processing of Substrates Using Moving Patterned Shutter”,AVS 52nd International Symposium, Boston, MA, October 30 – November 4, 2005.

    14. N.Laidani, G.Gottardi, R.Bartali, V.Micheli, M.Anderle, “Optical and mechanical characterization of ZrO2-X-C films”, Symposium R, E-MRS Spring Meeting, Nice, France, May 29-June 2, 2006.

    15. M.Bersani, G.Pepponi, D.Giubertoni, S.Gennaro and M.Anderle “Arsenic shallow distribution formed by solid phase epitaxial regrowth: an EXAFS and MEIS study”, IIT 2006, 16th Int. Conf. on Ion Implantation Technology, Marseille, France, June 11-16, 2006

    16. S. Forti, L. Lunelli, A. Lui, L. Pasquardini, C. Pederzolli, L. Vanzetti, M. Vinante and M. Anderle, M. Giorcelli, S. Porro, S. Musso, M. Rovere, A. Tagliaferro, “Plasma protein adsorption and platelet adhesion on various carbon films”, SMAC 2006-6th Specialist Meeting on Amorphous Carbon,Heraclion, Crete, Greece, September 10 -13, 2006

    17. L.Pasquardini, S.Fiorilli, S.Forti, L.Lunelli, C.Pederzolli, L.Vanzetti, M.Vinante, E.Garrone and M.Anderle, “Amino-silane and chitosan coated silicon substrates for DNA extraction”, AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17, 2006.

    18. S.Forti, R.Canteri, R.Dell’Anna, C.Della Volpe, L.Lunelli, L.Pasquardini, L.Vanzetti, C.Pederzolli and M.Anderle, “The influence of materials surface properties on the polymerase activity in microchip-based PCR”, AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17, 2006.

    19. S.Engelmann, R.L.Bruce, B.F.Smith, T.Kwon, R.Phaneuf, G.S.Oehrlein, E.A.Hudson, P.Lazzeri and M.Anderle, “Modifications of advanced photoresist polymers after plasma processing”, AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17, 2006.

    20. D.G.Nest, M.Goldman, D.B.Graves, S.Engelmann, R.L.Bruce, B.F.Smith, T.Kwon, R.Phaneuf, G.S. Oehrlein, C.Andes, E.A.Hudson, P.Lazzeri and M.Anderle, “Study of energetic ion and radicals beams interacting with advanced photoresist polymers”, AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17, 2006.

    21. M.Bersani, G.Pepponi, D.Giubertoni, S.Gennaro, M.Anderle, R.Doherty and M.A.Foad, “Arsenic ultra shallow junction deactivation investigated by multitechnique analytical approach”, AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17, 2006.

    22. .S.Kuo, G.S.Oehrlein, P.Jiang, P.Lazzeri, M.Bersani, S.Pederzoli, and M.Anderle, “Process performance of H2 remote plasma based photoresist ashing processes and their influence on ULK materials modifications”, AVS 53rd International Symposium & Exhibition, San Francisco, USA, November 12-17, 2006.

    23. G. Gottardi, N. Laidani, V. Micheli, R. Bartali, M. Anderle “Effects of oxygen concentration in the Ar/O2 plasma on the bulk structure and surface properties of RF reactively sputtered Zirconia thin films”, Symposium Q, E-MRS 2007 Spring Meeting, Strasbourg, France, May 28-June 1, 2007

    24. M.Barozzi, E.Iacob, L.Vanzetti, M.Bersani, M.Anderle, C.Kompocholis, M.Ghulinyan, P.Bellutti, G.Pucker, “Multilayer silicon rich oxy-nitride films characterizationby SIMS, VASE, and AFM”, 17th International Vacuum Congress, Stockholm, Sweden, July 2-6, 2007

    25. R.Canteri, R.Dell’Anna, S.Forti, L.Lunelli, L.Pasquardini, L.Vanzetti, M.Anderle, C.Pederzolli. “Chemical characterization of Tag DNA polymerase adsorption on different surfaces”, AVS 54th International Symposium & Exhibition, Seattle, USA, October 14-19, 2007.

    26. L. Henn-Lecordier, E.Robertson, P.Banerjee, G.W.Rubloff and M.Anderle, “Combinatorial strategy to address the complexities of surface chemistry and multicomponent materials in atomic layer deposition”, AVS – The Science and Technology Society 54th International Symposium & Exhibition, Seattle, USA, October 14-19, 2007.