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    Mariano Anderle publications on journals with international referee board

     

     

    Papers 1-20 21-40 41-60 61-80 81-100 101-120 121-140

     

     

    1. "Plasma-Surface Interactions of Nanoporous Silica during Plasma-Based Pattern Transfer Using C4F8 and C4F8/Ar Gas Mixtures", X. Hua, C. Stolz, G. S. Oehrlein, P. Lazzeri, N. Coghe, M. Anderle, C. K. Inoki, T. S. Kuan, and P. Jiang, J. Vac. Sci. Technol. A 23, 151 (2005).

     

    1. “Stress and interfacial defects induced by amorphous carbon film growth on silicon”, C. Macchi, S. Mariazzi, A. Zecca, G.P. Karwasz, R.S. Brusa, N. Laidani, R. Bartali, G. Gottardi and M. Anderle, Diamond and Related Materials 14, 1036 (2005).

     

    1. “Amorphous carbon films PACVD in CH4–CO2 under pulsed and continuous substrate bias conditions”
      G. Gottardi, N. Laidani, R. Bartali, M. Filippi, L. Calliari, R.S. Brusa, S. Mariazzi, C. Macchi and M. Anderle, Diamond and Related Materials 14, 1031 (2005).

     

    1. "Carbon film deposition on polyethylene terephtalate by pulsed plasma technology", N.Laidani, R.Bartali, M.Anderle, P.Chiggiato and G. Chuste, Diamond and Related Materials 14, 1023 (2005).

     

    1. "Argon-hydrogen rf plasma study for carbon film deposition", N.Laidani, R.Bartali, P Tosi and  M.Anderle J.Phys.D 37, 2593 (2004).

     

    1. "Investigation of Surface Modifications of 193 nm and 248 nm Photoresist Materials During Low-Pressure Plasma Etching", L. Ling, X. Hua, X. Li, G. S. Oehrlein, E. Hudson, P. Lazzeri, N. Coghe, M. Anderle, J. Vac. Sci. Technol. B 22, 2594 (2004).

     

    1. "Integration of benzocyclobutene polymers and silicon micromachined structures using anisotropic wet etching", N. Ghalichechian, A. Modafe, R. Ghodssi, P. Lazzeri, V. Micheli, and M. Anderle, J. Vac. Sci. and Technol. B 22, 2439 (2004).

     

    1. "Topography induced by sputtering in a magnetic sector instrument: an AFM and SEM study”, E. Iacob, M. Bersani, A. Lui, D. Giubertoni, M. Barozzi and M. Anderle, Applied Surface Science 238, 24 (2004).

     

    1. “Sample holder implement for very small samples on SC-Ultra SIMS instrument”, M. Barozzi, D. Giubertoni, M. Sbetti, M. Anderle and M. Bersani, Applied Surface Science 231-232C, 959 (2004).

     

    1. “Short-term and long-term RSF repeatability for Cameca SC-Ultra SIMS measurements”, M. Barozzi, D. Giubertoni, M. Anderle and M. Bersani, Applied Surface Science 231-232C, 768 (2004).

     

    1. “Arsenic shallow depth profiling: accurate quantification in SiO2/Si stack”, M. Barozzi, D. Giubertoni, M. Anderle and M. Bersani,Applied Surface Science 231-232C, 632 (2004).

     

    1. “ToF-SIMS studies of nanoporous PMSSQ materials: kinetics and reactions in the processing of low-k dielectrics for ULSI applications”, P. Lazzeri, G. Rubloff, L. Vanzetti, R.M Briber, M. Anderle, M. Bersani, J.J. Park, H.-C. Kim, W. Volksen, R.D. Miller, Z. Lin, Surf. Interface Anal. 36, 304 (2004).

     

    1. “Optimization of SIMS ultra shallow boron profiles using an oblique incidence O2+ beam”, D.Giubertoni, M. Barozzi, M. Anderle, M. Bersani, J. Vac. Sci. Technol. B 22(1), 336 (2004).

     

    1. "Role of chemical interactions in bacterial adhesion to polymer surfaces" G.Speranza, G.Gottardi, C.Pederzolli, L.Lunelli, R.Canteri, L Pasquardini, E.Carli, A.Lui, D.Maniglio, M.Brugnara and M.Anderle Biomaterials 25, 2029 (2004).

     

    1. “Material characterization and the formation of nanoporous PMSSQ low-k dielectrics” P. Lazzeri, L. Vanzetti, E. Iacob, M. Bersani, M. Anderle, J.J. Park, Z. Lin R.M. Briber, G.W. Rubloff, R.D. Miller, Characterization and Metrology for ULSI Technology: 2003 International Conference, edited by D. G. Seiler, A. C. Diebold, T. J. Shaffner, R. McDonald, S. Zollner, R. P. Khosla, E. M. Sekula, New York, AIP Conference Proceedings 683, 551 (2003).

     

    1. “In situ sputtering rate measurement by laser interferometer applied to SIMS analyses”, M. Bersani, D. Giubertoni, M. Barozzi, S. Bertoldi, L. Vanzetti, E. Iacob and M.Anderle, Characterization and Metrology for ULSI Technology: 2003 International Conference, edited by D. G. Seiler, A. C. Diebold, T. J. Shaffner, R. McDonald, S. Zollner, R. P. Khosla, E. M. Sekula, New York, AIP Conference Proceedings 683, 705 (2003)

     

    1. “Ultra shallow depth profiling by secondary ion mass spectrometry”, M. Anderle, M. Barozzi, M. Bersani, D. Giubertoni, P. Lazzeri, Characterization and Metrology for ULSI Technology: 2003 International Conference, edited by G.G. Seiler, A.C. Diebold, T.J. Shaffner, R. McDonald, S. Zollner, R.P. Khosla, E.M. Sekula, New York, AIP Conference Proceedings 683, 695 (2003).

     

    1. “Arsenic shallow implant characterization by magnetic sector and time of flight SIMS instruments”, M.Bersani, P.Lazzeri, D.Giubertoni, M.Barozzi and M.Anderle, Ion Implantation Technology IIT2002 Proceedings, edited by B. Brown, T. L. Alford, M. Nastasi, M. C. Vella, Piscataway(NJ) USA, IEEE 268 (2003).

     

    1. “Tof-Sims and XPS surface characterization of novel perfluoropolyether-urethane ionomers from aqueous dipersions”, R.Canteri, G.Speranza, M.Anderle, S.Turri, S.Radice, Surf. Interf. Anal 35, 318 (2003).

     

    1. “D-Sims and TOF-SIMS quantitative depth profiles on ultra thin oxinitrides”; M.Bersani, D.Giubertoni, M.Barozzi, E.Iacob, L.Vanzetti, M.Anderle, P.Lazzeri, B.Crivelli, and F.Zanderigo; Applied Surface Science 203-204, 281(2003).